The global market for sputtered films and sputtering targets should reach over $3.2 billion by 2021 from nearly $2.9 billion in 2016 at a compound annual growth rate (CAGR) of 2.2%, from 2016 to 2021.
STUDY GOALS AND OBJECTIVES
Sputtering is one of the most popular technologies for deposition of thin films. Although sputtering was first developed nearly two centuries ago, since World War II it has become increasingly important for the creation of innovative devices. For decades, sputtering has been the basic fabrication process for integrated circuits. It has allowed the semiconductor industry to keep pace with Moore’s Law and has created a reliable path for achieving device miniaturization in many industry sectors beyond electronics. Our Research has followed the market for sputtering targets for 15 years, reporting on key developments related to production methods, materials and applic ations for sputtering targets. During this period, the market has expanded at a healthy compound annual growth rate (CAGR) of 8.3% for the period 2001 through 2016.
With this study, Our Research continues its commitment to monitoring the market for sputtering targets, by providing an updated review of the most important advances in sputtering technology and target fabrication. In addition, a detailed overview of the current market for sputtering targets is offered together with an objective analysis of industry and technological trends, as well as prospects for future growth.
Specifically, the major objectives of this study are to:
-Provide an update on the most advanced sputtering methods and emerging processes.
-Provide an overview of the most common materials used for the fabrication of sputtering targets and identify new materials.
-Review the latest methods for fabricating sputtering targets.
-Highlight new technological developments in the fabrication of sputtering targets, while outlining technical issues.
-Review existing fields of application for sputtering technologies and investigate emerging applications.
-Estimate current global markets for sputtering targets and sputtered films by application, material type and region, with growth forecasts through 2021 for each market segment.
-Identify important technology and industry trends within each market segment.
-Supply an updated review of current industry players, including manufacturers of sputtering targets, materials and fabrication equipment, technology developers and future market participants.
-Provide a description of the most relevant research and development activities.
-Determine trends in recently issued U.S. patents.
REASONS FOR DOING THIS STUDY
The global market for thin-film technologies (including equipment, materials and services) is estimated to be valued at over $70 billion in 2016, with growth expected to continue. Sputtering accounts for approximately one-quarter of this market.
For decades, sputtering was used primarily in electronics for fabrication of semiconductor devices. Over time, however, sputtering has found application within a broad range of fields such as optoelectronics, energy, mechanical/chemical, optical coatings, life sciences and others.
Currently, electronics remains one of the largest sectors, accounting for approximately one-third of the total sputtering target market. In the interim, other sectors have grown to represent a significant share of the market and, going forward, are expected to become the driving force for sustaining market growth.
The principal reason for doing this study is to present a current assessment of the sputtering target industry from both a technological and market point of view and to outline future trends and key developments.
There is also a need to evaluate the current status and future trends of this market from a global standpoint. As use of these products expands and new fields of application emerge, information on the suppliers and developers of sputtering targets and their regional distribution becomes more valuable.
An equally important reason for undertaking this study is to provide technical insights into sputtering target manufacturing by:
-Providing a review of target types, their applications, and production methods.
-Identifying current technological trends.
-Providing an overview of the main global research and development (R&D) activities related to sputtering targets, resulting in the issuance of patents.
-Illustrating the latest technological developments.
This information can assist companies in identifying opportunities for process and productivity improvements and new product development, resulting in a positive impact on future market growth.
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